Sputter Deposition System (MDT-1;MDT-2;MDT-3) 

MDT-1: Ultra high vacuum magnetic sputtering system with 8 inch wafer and angstrom film deposition capability. The system includes 10 cathodes with multi-target deposition capability, and it can process up to 100 layers. Also this system has high temperature capability of up to 700℃.

MDT-2: Ultra high vacuum magnetic sputtering system with 8 inch wafer and angstrom film deposition capability. The system includes 10 cathodes with multi-target deposition capability, and it can process up to 100 layers.

MDT-3: Ultra high vacuum magnetic sputtering system with 8 inch wafer and angstrom film deposition capability. The system includes 10 cathodes with multi-target deposition capability, and it can process up to 100 layers.